Rennex, B.
(1994),
Standard Reference Materials: Certification of a Standard Reference Material for the Determination of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed January 16, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Standard Reference Materials: Certification of a Standard Reference Material for the Determination of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry
Published
Author(s)
Citation
Special Publication (NIST SP) -
NIST Pub Series
Pub Type
NIST Pubs
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created September 9, 1994, Updated February 17, 2017