Rennex, B.
(1994),
Standard Reference Materials: Certification of a Standard Reference Material for the Determination of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed May 18, 2024)
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Standard Reference Materials: Certification of a Standard Reference Material for the Determination of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry
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Created September 9, 1994, Updated February 17, 2017