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Standard Reference Materials: Certification of a Standard Reference Material for the Determination of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry

Published

Author(s)

Brian G. Rennex
Citation
Special Publication (NIST SP) -

Citation

Rennex, B. (1994), Standard Reference Materials: Certification of a Standard Reference Material for the Determination of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Spectrophotometry, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD (Accessed June 19, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created September 9, 1994, Updated February 17, 2017