Stacked SNS Josephson Junctions for Quantum Voltage Applications

Published

July 11, 2003

Author(s)

Paul Dresselhaus, Yonuk Chong, Samuel Benz

Abstract

NIST is using SNS Josephson junctions as the basis of quantum voltage metrology. Planar junction technology limits the voltage and bandwidth of these systems due to parasitic inductances and the transit time of waveforms through the transmission line. By using stacked junctions, we are able to pack junctions more closely in a transmission line, while maintaining the uniformity needed for voltage standard applications. We discuss the technological advantages in stacking multiple junctions and present data from stacked junctions. The normal metal used for these stacked junction arrays is MoSi₂. Stacked junctions using this barrier material have demonstrated excellent uniformity and similar etch characteristics to niobium. We present measurements of synthesized ac waveforms made with arrays of double junction stacks.

Proceedings Title

Ext. Abstracts, 2003 Intl. Superconductive Electronics Conf. (ISEC)

Conference Dates

July 7-11, 2003

Conference Location

Sydney, 1, AS

Pub Type

Conferences

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Keywords

Josephson junction, stacked junction, voltage standard, Josephson array

Citation

Dresselhaus, P. , Chong, Y. and Benz, S. (2003), Stacked SNS Josephson Junctions for Quantum Voltage Applications, Ext. Abstracts, 2003 Intl. Superconductive Electronics Conf. (ISEC), Sydney, 1, AS, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31365 (Accessed October 27, 2025)