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In Situ oxidation of Y?O?-doped Si?N?:



N J Tighe, K Kuroda, T E Mitchell, A H Heuer
- NBS IR 80-2075
Report Number
NBS IR 80-2075


Tighe, N. , Kuroda, K. , Mitchell, T. and Heuer, A. (1980), In Situ oxidation of Y?O?-doped Si?N?:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], (Accessed June 22, 2024)


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Created January 1, 1980, Updated May 19, 2023