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Simultaneous Monitoring of Wafer and Environment-States During Molecular Beam Epitaxy

Published

Author(s)

K. J. Knopp, J. R. Ketterl, David H. Christensen, T. P. Pearsall, J. R. Hill
Proceedings Title
Proc., Mat. Res. Soc. Symp. on Thin Films Structure and Morphology,
Volume
441
Conference Dates
December 2-6, 1996
Conference Location
Boston, MA

Citation

Knopp, K. , Ketterl, J. , Christensen, D. , Pearsall, T. and Hill, J. (1997), Simultaneous Monitoring of Wafer and Environment-States During Molecular Beam Epitaxy, Proc., Mat. Res. Soc. Symp. on Thin Films Structure and Morphology,, Boston, MA (Accessed April 16, 2024)
Created September 30, 1997, Updated October 12, 2021