Knopp, K.
, Ketterl, J.
, Christensen, D.
, Pearsall, T.
and Hill, J.
(1997),
Simultaneous Monitoring of Wafer and Environment-States During Molecular Beam Epitaxy, Proc., Mat. Res. Soc. Symp. on Thin Films Structure and Morphology,, Boston, MA
(Accessed May 10, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Simultaneous Monitoring of Wafer and Environment-States During Molecular Beam Epitaxy
Published
Author(s)
K. J. Knopp, J. R. Ketterl, , T. P. Pearsall, J. R. Hill
Proceedings Title
Proc., Mat. Res. Soc. Symp. on Thin Films Structure and Morphology,
Volume
441
Conference Dates
December 2-6, 1996
Conference Location
Boston, MA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created September 30, 1997, Updated October 12, 2021