Belzer, B.
and Blackburn, D.
(1997),
Semiconductor Measurement Technology: The Results of an Interlaboratory Study of Ellipsometric Measurements of Thin Film Silicon Dioxide on Silicon, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed October 10, 2024)
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Semiconductor Measurement Technology: The Results of an Interlaboratory Study of Ellipsometric Measurements of Thin Film Silicon Dioxide on Silicon
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Created April 30, 1997, Updated October 12, 2021