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Semiconductor Measurement Technology: The Results of an Interlaboratory Study of Ellipsometric Measurements of Thin Film Silicon Dioxide on Silicon

Published

Author(s)

Barbara J. Belzer, David L. Blackburn
Citation
Special Publication (NIST SP) -

Citation

Belzer, B. and Blackburn, D. (1997), Semiconductor Measurement Technology: The Results of an Interlaboratory Study of Ellipsometric Measurements of Thin Film Silicon Dioxide on Silicon, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD (Accessed June 17, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 30, 1997, Updated October 12, 2021