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Search Publications by: Colton Dudley (Fed)

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Harnessing the extreme ultraviolet for critical dimension metrology

March 17, 2026

Author(s)

Bryan Barnes, Purnima P. Balakrishnan, John Burnett, Aaron Chew, Colton Dudley, Thomas Germer, Steven Grantham, Stephanie Moffitt, Eric Shirley, Martin Sohn, Daniel Sunday

The semiconductor industry has long adopted visible and ultraviolet wavelengths for optical critical dimension (OCD) measurements. Decreasing feature sizes, increasing architecture complexity, and troublesome parametric correlations all motivate approaches

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