July 1, 2026
Author(s)
Daniel Sunday, Peter Dudenas, Priyanka Ketkar, Julia Murphy, Cherno Jaye, Regis Kline, Gurpreet Singh, Eungnak Han, Lauren Doyle, Florian Gstrein
Photoresist patterning for semiconductor manufacturing is encountering new challenges with the move the extreme ultraviolet (EUV) lithography, driven by smaller pitches, thinner resists and fewer photons. Obtaining information about the nanoscale