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Measurement sensitivity of DUV scatterfield microscopy parameterized with partial coherence for duty ratio-varied periodic nanofeatures

February 1, 2022

Author(s)

Taekyung Kim, Eikhyun Cho, Yoon Sung Bae, Sang-Soo Choi, Bryan Barnes, Richard M. Silver, Martin Sohn

The deep ultraviolet (DUV) scatterfield imaging microscopy technique enables accurate dimensional measurements of periodic nanostructures with sub-nanometer sensitivity to support semiconductor device manufacturing. A parametric sensitivity analysis for

A 3-DOF MEMS motion stage for scanning tunneling microscopy

January 1, 2022

Author(s)

Taekyung Kim, Jason J. Gorman

Piezoelectric tube scanners used in most conventional scanning tunneling microscopes (STM) are highly resonant mechanisms that require a low-bandwidth controller (