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Search Publications by: Jonathan E. Guyer (Fed)

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Displaying 76 - 84 of 84

In Situ Diffuse Reflectance Spectroscopy for Measurement and Control of III-V Molecular Beam Epitaxy

March 17, 2000
Author(s)
Jonathan E. Guyer, W. F. Tseng, W. R. Thurber, Eric M. Vogel, Monica D. Edelstein, Donald A. Gajewski, Joseph G. Pellegrino
We report the use of diffuse reflectance spectroscopy for active, closed-loop control of substrate temperature during the growth of a modulation doped heterostructure. Measurement and control of substrate temperature is a common difficulty for molecular

In situ Metrology During the Growth of Compound Semiconductors by Molecular Beam Epitaxy

February 9, 2000
Author(s)
Donald A. Gajewski, Jonathan E. Guyer, Nhan Van Nguyen, Joseph G. Pellegrino
In this poster, we present the optical response of thin film compound semiconductors measured using in situ spectroscopic ellipsometry (SE), at growth temperatures ((180 to 600) 0C), during the growth by molecular beam epitaxy (MBE). We will focus on in