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Search Publications by: John A. Kramar (Fed)

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Displaying 26 - 50 of 134

Kinematic Modeling and Calibration of a Flexure Based Hexapod Nanopositioner

August 21, 2012
Author(s)
Hongliang Shi, Hai-Jun Su, Nicholas Dagalakis, John A. Kramar
This paper covers the kinematic modeling of a flexure-based, hexapod nanopositioner and a new method of calibration for this type of nanopositioner. This six degrees of freedom tri-stage nanopositioner can generate small displacement, high-resolution

TSOM Method for Semiconductor Metrology

April 18, 2011
Author(s)
Ravikiran Attota, Ronald G. Dixson, John A. Kramar, James E. Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM and

Scanning Probe Microscope Dimensional Metrology at NIST

December 21, 2010
Author(s)
John A. Kramar, Ronald G. Dixson, Ndubuisi G. Orji
Scanning probe microscopy (SPM) dimensional metrology efforts at the U.S. National Institute of Standards and Technology are reviewed. The main SPM instruments for realizing the International System of Units (SI) are the Molecular Measuring Machine, the

A COMPACT, COMPOUND ACTUATOR FOR THE MOLECULAR MEASURING MACHINE

October 19, 2008
Author(s)
Jing Li, Yin-Lin Shen, Jaehwa Jeong, Fredric Scire, John A. Kramar
A compact, two-stage, vertical actuator with built-in sensors has been developed for the Molecular Measuring Machine (M3) and other potential precision instrumentation applications, such as scanning probe microscopy (SPM). In this article, we describe the

Comparison of NIST SI Force Scale to NPL SI Mass Scale

October 19, 2008
Author(s)
Christopher W. Jones, John A. Kramar, Stuart Davidson, Richard Leach, Jon R. Pratt
Small masses in the 1.0 mg to 0.1 mg range were developed and calibrated at NPL with traceability to the IPK. These masses were transported to NIST at Gaithersburg and used as deadweights on the NIST electrostatic force balance, to facilitate a mass-force

Spring constant calibration of AFM cantilevers with a piezosensor transfer standard

September 24, 2007
Author(s)
Eric Langlois, Gordon A. Shaw, John A. Kramar, Jon R. Pratt, Donna C. Hurley
We describe a method to calibrate the spring constants of cantilevers for atomic force microscopy (AFM). The method makes use of a piezosensor comprised of a piezoresistive cantilever and accompanying electronics. The piezosensor was calibrated before use

Instrumentation, Metrology, and Standards for Nanomanufacturing

September 10, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over the

The Helium Ion Microscope: A New Tool for Nanotechnology and Nanomanufacturing

September 1, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over the

A Piezoresistive Cantilever Force Sensor for Direct AFM Force Calibration

April 8, 2007
Author(s)
Jon R. Pratt, John A. Kramar, Gordon A. Shaw, Douglas T. Smith, John M. Moreland
We describe the design, fabrication, and calibration testing of a new piezoresistive cantilever force sensor suitable for the force calibration of atomic force microscopes in a range between tens of nanonewtons to hundreds of micronewtons. The sensor is

Helium Ion Microscopy: A New Technique for Semiconductor Metrology and Nanotechnology

January 1, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
The Helium Ion Microscope (HIM) offers a new, potentially disruptive technique for nano-metrology. This methodology presents an approach to measurements for nanotechnology and nano-manufacturing which has several potential advantages over the traditional