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NIST Authors in Bold

Displaying 15826 - 15850 of 73893

Implementing Speed and Separation Monitoring in Collaborative Robot Workcells

August 1, 2016
Author(s)
Jeremy A. Marvel, Richard J. Norcross
We provide an overview and guidance for the speed and separation monitoring methodology as presented in the International Organization of Standardization's technical specification 15066 on collaborative robot safety. Such functionality is provided by

Integrating Top-down and Bottom-up Cybersecurity Guidance using XML

August 1, 2016
Author(s)
Joshua Lubell
This paper describes a markup-based approach for synthesizing disparate information sources, and then discusses a software implementation of the approach. The implementation, developed using XForms and Extensible Stylesheet Language Transformations (XSLT)

Measurement and Modeling of Polarized Specular Neutron Reflectivity in Large Magnetic Fields

August 1, 2016
Author(s)
Brian B. Maranville, Brian J Kirby, Alexander J Grutter, Paul Kienzle, Charles F. Majkrzak, Yaohua Liu, Cindi L. Dennis
The presence of a large applied magnetic field removes the degeneracy of the vacuum energy states for spin-up and spin-down neutrons. For polarized neutron reflectometry, this must be included in the reference potential energy of the Schrodinger equation

New Technologies and Standards Enabling Grid Modernization

August 1, 2016
Author(s)
David A. Wollman, Clark Gellings
“The smart grid, or grid modernization, integrates new interoperable and secure sensing,control, communications, information technologies and power technologies to increase the system efficiency, reliability, resilience, and sustainability of our electric

Results from the Magnetic Suspension Mass Comparator for Vacuum-to-Air Mass Dissemination in Support of the Redefinition of the Kilogram

August 1, 2016
Author(s)
Corey A. Stambaugh, Eric C. Benck, Edward C. Mulhern, Patrick J. Abbott, Zeina J. Kubarych
Experiments to realize the new definition of the kilogram will be carried out in vacuum. NIST has developed a magnetic suspension mass comparator to disseminate the new definition to air. This paper details the current status of the system. This includes

The Canonical Robot Command Language (CRCL)

August 1, 2016
Author(s)
Frederick M. Proctor, Stephen B. Balakirsky, Zeid Kootbally, Thomas R. Kramer, Craig I. Schlenoff, William P. Shackleford
Industrial robots can perform motion with sub-millimeter repeatability when programmed using the teach-and-playback method. While effective, this method requires significant up-front time, tying up the robot and a person during the teaching phase. Off-line

Transient Optical and Terahertz Spectroscopy of Nanoscale RuO2

August 1, 2016
Author(s)
Edwin J. Heilweil, Brian G. Alberding, Paul D. Cunningham, Joseph S. Melinger, Jeffrey C. Owrutsky, Adam D. Dunkelberger
Solution-deposited nanoscale films of RuO2, “nanoskins,” are effective transparent conductors because after calcining to 523 K they exhibit flat optical extinction across the visible and infrared combined with relatively high electrical conductivity. Upon

New Standard Provides Framework for Smart Grid Testing and Certification

July 31, 2016
Author(s)
Cuong T. Nguyen, Khaled Masri
In May 2016, the National Electrical Manufacturers Association (NEMA) published a new standard, Smart Grid Interoperability Process Reference Manual, ANSI/NEMA SG-IPRM 1-2016 (IPRM). The standard codifies a 40-page publication, the Interoperability Process

Color Quality Metrics Recent Progress and Future Perspective

July 30, 2016
Author(s)
Yoshihiro Ohno
The color quality of light sources for lighting includes the effects of white light chromaticity, as well as color rendition characteristics, including color fidelity and the aspects related to color preference and perception. In this paper, the current

Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings

July 29, 2016
Author(s)
Houxun Miao, Lei Chen, Mona Mirzaeimoghri, Richard Kasica, Han Wen
The cryogenic process and Bosch process are two widely used processes for reactive ion etching of high aspect ratio silicon structures. This paper focuses on the cryogenic deep etching of 400.0 nm pitch silicon gratings. By creating a metal hard mask on
Displaying 15826 - 15850 of 73893
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