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Displaying 126 - 150 of 74609

Beyond the Click: Experts Weigh in on the Phishing Training Debate

July 15, 2026
Author(s)
Shanee Dawkins, Julie Haney
The efficacy of phishing simulation training is a hotly-debated topic. Three cybersecurity experts from academia and industry discuss the reasons why many phishing training programs fail to change behavior, the importance of meaningful measures of

RADmapper: An Interoperable Mapping Specification

July 15, 2026
Author(s)
Peter Denno
This report describes a data mapping language, RADmapper, designed to provide an interoperable exchange form for expressing the intent of typical mapping and data restructuring needs. The exchange form of RADmapper code is intended to be translateable (by

A playbook for harmonization of standards for emergent viral pathogens

July 13, 2026
Author(s)
Sara Suliman, Megan Cleveland, Neil Almond, Mojca Milavec, Denise O'Sullivan, Peter Vallone, Marc Salit
Effective clinical and public health decision-making during a pandemic depends on reliable and interoperable clinical diagnostic test results. To ensure trustworthy outcomes, we need widely available calibration standards harmonized to a shared scale. We

Application of 360 Degree Imaging and Construction Progress Documentation Platforms in Large-scale Experimental Testing: A CFS10 Case Study

July 13, 2026
Author(s)
Amanpreet Singh, Matthew Speicher, Fidence Cyizere Rukundo, Benjamin Schafer, Tara Hutchinson
Large-scale experimental testing requires documentation of construction processes and damage throughout testing. Traditional photographic records, while useful, face challenges of organization and accessibility, and ease of use. To address these issues

Terrestrial laser scanners and contrast targets: Effect of algorithm, resolution, distance, and target rotational orientation on center coordinate

July 13, 2026
Author(s)
Balasubramanian Muralikrishnan, Aum Shah, Mary Gregg, Katharine Shilling, Vincent Lee, Braden Czapla
Terrestrial laser scanners (TLSs) are portable dimensional measurement instruments that produce a 3D point cloud by measuring the distance and two angles to points in the scene. Contrast targets are sometimes used to evaluate the performance of these

ToF-SIMS Single Beam Depth Profiling and Ion Beam-Induced Hydrophobic Patterning of a Novel Nanoporous Gold Absorber for Decay Energy Spectroscopy

July 10, 2026
Author(s)
Shinichiro N. Muramoto, Robert Verkouteren, Adam Pearce, Ryan Fitzgerald, Denis Bergeron
Decay energy spectroscopy relies on the absorber, a small substrate where the radioisotopes are embedded and thermalized, for high counting efficiency and spectroscopic resolution. This absorber in the form of a nanoporous Au was manufactured to prevent

The Importance of Sub-nanosecond Relaxations on the Ballistic Impact Resistance of Cross-linked Thermoset Network Polymers

July 8, 2026
Author(s)
Christopher Soles, Katherine Evans, Polette Centellas, Adam Biacchi, Angela Hight Walker, Madhu Sudan Tyagi, Kanae Ito, Christian Yoon, Adam Burns, Timothy Sirk, Kevin Masser, Joseph Lenhart, Joseph Dennis, Kohei Sasaki, Naoyuki Shoji, Takefumi Yamashita, Hiroshi AKIBA, Yoshinori Ohmasa
This manuscript explores the importance of the collective, many atom relaxations that occur in cross-linked glassy polymer networks on the picosecond to nanosecond time scale on the mechanical toughness of these materials under ballistic rates of

ENABLING MODELERS TO TEST THEIR SIMULATIONS AGAINST RIGOROUS, HIGHLY CONTROLLED ADDITIVE MANUFACTURING BENCHMARK (AM BENCH) MEASUREMENT DATA

July 6, 2026
Author(s)
Jordan Weaver, David Deisenroth, Jesse Redford, Sergey Mekhontsev, Sandra Young, Brandon Lane, Lyle Levine
The Additive Manufacturing Benchmark Test Series (AM Bench) is a National Institute of Standards and Technology (NIST) led organization that provides a continuing series of additive manufacturing (AM) benchmark measurements, challenge problems, and

Depth Profiling Chemical Changes in Chemically Amplified Resists for EUV Lithography

July 1, 2026
Author(s)
Daniel Sunday, Peter Dudenas, Priyanka Ketkar, Julia Murphy, Cherno Jaye, Regis Kline, Gurpreet Singh, Eungnak Han, Lauren Doyle, Florian Gstrein
Photoresist patterning for semiconductor manufacturing is encountering new challenges with the move the extreme ultraviolet (EUV) lithography, driven by smaller pitches, thinner resists and fewer photons. Obtaining information about the nanoscale

Communications Technology Laboratory's 6G Communications Roadmap

June 30, 2026
Author(s)
Richard Rouil, Nada Golmie, Miller Higgins, Ashlee Walker
The National Institute of Standards and Technology (NIST) Communications Technology Laboratory (CTL) developed the 6G Communications Roadmap (the roadmap) to prioritize future NIST investments in 6G Communications research that aligns with high-priority
Displaying 126 - 150 of 74609
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