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Standards

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Displaying 1 - 25 of 823

Securing the Future of NMR Metabolomics Reproducibility: A Call for Standardized Reporting

September 15, 2025
Author(s)
Tracey Johnston, Fabio Casu, Amanda Bayless, Erik Andersson, Robert Brua, Munki Choo, Arthur S. Edison, Hamid R. Eghbalnia, Candace Fleischer, Goncalo J Gouveia, Jeffrey C. Hoch, Gagandeep Kaur, Da-Wei Li, Wimal Pathmasiri, Istvan Pelczer, Fay Probert, Daniel Raftery, David Rovnyak, Michael Secreto, Panteleimon Takis, Mario Uchimiya, David S Wishart, Ali Yilmaz, Lloyd Sumner, Robert Powers, Valerie Copie, Teklab Gebregiworgis
Metabolomics has been a rapidly growing multidisciplinary field with ever increasing demand and usability, attracting a surge of new researchers. While their varied skill sets, questions, and approaches enrich the field with fresh perspectives and

Certification of 3180 Series Standard Reference Materials(R) Anions in Solution

August 26, 2025
Author(s)
Brian Lang, Thomas Vetter, John Molloy, Antonio Possolo
The 3180 series Standard Reference Materials (SRMs) are single anion solutions intended for use as primary calibration standards for the quantitative determination of a single anion and are a key link in the traceability chain for analysis measurements of

NIST Handbook HB-150-3 2025 Edition

July 31, 2025
Author(s)
Derek Ho, Shelby Williamson, Hazel Richmond
NIST Handbook 150-3 presents the technical requirements and guidance for the accreditation of laboratories under the National Voluntary Laboratory Accreditation Program (NVLAP) Bulk Asbestos Fiber Analysis program. It is intended for information and use by

Implementation of a 1 GO star-mesh graphene quantum Hall array resistance standard network for high resistance calibration

July 3, 2025
Author(s)
Dean Jarrett, Albert Rigosi, Yanfei Yang, Alireza Panna, David Newell, Ngoc Thanh Mai Tran, Wei-Chen Lin, Marta Musso, Cheng-Hsueh Yang, Chi-Te Liang, Massimo Ortolano, Randolph Elmquist
A 1 GΩ star-mesh quantized Hall array resistance standard (QHARS) made of thirty-seven quantum Hall effect (QHE) elements was fabricated and tested. The 1 GΩ QHARS has three orders of magnitude fewer QHE elements than a largely series 1 GΩ QHARS, which

Towards an Understanding of Robotic Bin-Picking Throughput

May 22, 2025
Author(s)
Anirudh Krishnan Komaralingam, Prem Rachakonda, Kamel Saidi, Armin Khatoonabadi
NIST is leading and supporting multiple efforts to develop standards for 3D imaging systems used for industrial automation. There are few standards for verifying the performance of these systems and NIST is working with ASTM subcommittee E57.23 on

NIST Special Publication 260 NIST.SP.260-256 Certification of Standard Reference Material(R)s 3672a & 3673a: Organic Contaminants in Smokers' Urine (Frozen) & Organic Contaminants in Non-Smokers' Urine (Frozen)

May 14, 2025
Author(s)
Ashley Russell, Carolyn Burdette, Johanna Camara, Nathanael Heckert, Jennifer Hoguet, Kevin Huncik, Jared Ragland, Elena Wood
Standard Reference Material (SRM) 3672a Organic Contaminants in Smokers' Urine (Frozen) and SRM 3673a Organic Contaminants in Non-Smokers' Urine (Frozen) are intended for use in evaluating analytical methods for the determination of selected naturally

Certification of Standard Reference Material(R) 1989 Monodisperse Irregularly Shaped Epoxy-Based Particles (Nominal 100 mm, 150 mm, 220 mm)

May 2, 2025
Author(s)
Srivalli Telikepalli, Dean Ripple, Michael Carrier, Kristen Steffens, David Newton, Christopher Montgomery, Nicholas Ritchie, Anthony Asmar, Michael Halter
Standard Reference Material (SRM) 1989 is a NIST particle standard produced using photolithographic methods and delivers a certified value for particle size of an irregularly shaped particle. This SRM was developed to allow a more accurate monitoring of

Interlaboratory Assessment of Candidate Reference Materials for Lentiviral Vector Copy Number and Integration Site Measurements

April 21, 2025
Author(s)
Hua-Jun He, Zhiyong He, Steven Lund, Barbara Paugh, Jennifer McDaniel, Justin Zook, Sierra Miller, Samantha Maragh, Simona Patange, Mahir Mohiuddin, Alessandro Tona, John Elliott, Kenneth Cole, Sheng Lin-Gibson
Reference materials are essential for accurately measuring integrated lentiviral vector (LV) copy number (VCN) and integration sites for the safety and efficacy of lentivirus-based gene therapy. We conducted an interlaboratory study on NIST candidate

Certification of Standard Reference Material(R) 965c Glucose in Frozen Human Serum

March 13, 2025
Author(s)
Amanda Bayless, William Davis, Elena Wood, Abraham Kuri Cruz, Johanna Camara, Blaza Toman, Komal Dahya, Katherine Earl, Chui Tse, Uliana Danilenko, Hubert Vesper
Standard Reference Material (SRM) 965c Glucose in Frozen Human Serum is intended for use in validating methods for the determination of glucose in human serum and plasma. A unit of SRM 965c consists of three ampoules each of four materials: Level 1, Level

Status Report on the Fourth Round of the NIST Post-Quantum Cryptography Standardization Process

March 11, 2025
Author(s)
Gorjan Alagic, Maxime Bros, Pierre Ciadoux, David Cooper, Quynh Dang, Thinh Dang, John Kelsey, Jacob Lichtinger, Yi-Kai Liu, Carl Miller, Dustin Moody, Rene Peralta, Ray Perlner, Angela Robinson, Hamilton Silberg, Daniel Smith-Tone, Noah Waller
The National Institute of Standards and Technology is selecting public-key cryptographic algorithms through a public, competition-like process. The new public-key cryptography standards will specify additional digital signatures, public-key encryption, and

Security for IEEE P1451.1.6-based Sensor Networks for IoT Applications

March 10, 2025
Author(s)
Eugene Song, Kang B. Lee, Hiroaki Nishi, Janaka Wejekoon
There are many challenges for Internet of Things (IoT) sensor networks including the lack of robust standards, diverse wireline and wireless connectivity, interoperability, security, and privacy. Addressing these challenges, the Institute of Electrical and

SLowFlowS: A novel flow standard for semiconductor process gases

March 1, 2025
Author(s)
Jodie Gail Pope, Keith A. Gillis, Aaron Johnson, Joey Boyd, John Wright
Numerous process gases are used in the production of semiconductor chips. Accurate metering of these gases into process chambers is critical for maximizing device throughput and yield. A national flow standard for semiconductor process gases does not exist

Additive Construction - The Path to Standardization II: Workshop Report

January 16, 2025
Author(s)
Shawn Platt
The "Additive Construction – The Path to Standardization II" workshop, hosted by the National Institute of Standards and Technology (NIST) and U.S. Army Engineer Research and Development Center (ERDC), brought together key players from the additive

A Helmholtz Energy Equation of State for 3,3,3-Trifluoroprop-1-ene (R-1243zf)

January 15, 2025
Author(s)
Ryo Akasaka, Eric Lemmon
A new fundamental equation of state expressed as a function of the Helmholtz energy is presented for 3,3,3-trifluoroprop-1-ene (R-1243zf). The equation is valid from the triple point temperature (122.35 K) to 430 K at pressures up to 35 MPa. The expected

2024 NIST Summary of U.S. Legal Metrology Activities

January 10, 2025
Author(s)
Juana Williams, John McGuire, Loren Minnich, Gloria Lee, Jan Konijnenburg, Isabel Baucom, Katrice Lippa
The NIST Office of Weights and Measures (OWM) presents its second issue of the 2024 NIST Annual Summary of U.S. Legal Metrology Activities report. This report includes a summary of changes made to NIST Handbook 44 (2024) Specifications, Tolerances and

Commutability Assessment of New Standard Reference Materials (SRMs) for Determining Serum Total 25-Hydroxyvitamin D using Ligand Binding and Liquid Chromatography - Tandem Mass Spectrometry (LC-MS/MS) Assays

January 10, 2025
Author(s)
Stephen Wise, Etienne Cavalier, Pierre LUKAS, Stephanie Peeters, caroline Le Goff, Laura Briggs, Emma Williams, Ekaterina Mineva, Christine Pfeiffer, Hubert Vesper, Christian Popp, Christian Beckert, Jan Schultess, Kevin Wang, Carole Tourneur, Camille Pease, Dominik Osterritter, Ralf Fischer, Ben Saida, Chao Dou, Satoshi Kojima, Hope Weiler, Agnieszka Bielecki, Heather Pham, Alexandra Bennett, Shawn You, Amit Ghoshal, Chistian Vogl, James Freeman, Neil Parker, Samantha Pagliaro, Jennifer Cheek, Jie Li, Hisao Tsukamoto, Karen Galvin, Kevin Cashman, Hsuan-Chieh Liao, Andrew Norbert Hoofnagle, Jeffery Budd, Adam Kuszak, Ashley Boggs-Russell, Carolyn Burdette, Grace Hahm, Federica Nalin, Johanna Camara
Commutability is where the measurement response for a reference material (RM) is the same as for an individual patient sample with the same concentration of analyte measured using two or more measurement systems. Assessment of commutability is essential
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