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Scanning Electron Microscopy at the National Institute of Standards and Technology

Published

Author(s)

Michael T. Postek

Abstract

An attitude has developed that the results of any SEM measurement arc absolutely true. If this were the case, there would be no need for standards and no metrological problems would exist in making submicrometer measurements. Multiple, basic errors associated with metrology in the SEM can exist. These were clearly demonstrated in the SEM interlaboratory study in which Texas A&M participated. Many of these problems can be overcome by calibration and careful use of the instrument. The SEM has become the technology of choice for submicrometer metrology, yet one must be extremely careful when doing any type of metrology with this instrument.
Citation
EM Views
Issue
10

Citation

Postek, M. (1995), Scanning Electron Microscopy at the National Institute of Standards and Technology, EM Views (Accessed April 23, 2024)
Created January 1, 1995, Updated February 19, 2017