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Round-Robin Study of Arsenic Implant Dose Measurement in Silicon by SIMS

Published

Author(s)

Richard M. Lindstrom, David S. Simons, R Bennett, R. Benbalagh, Bruce S. MacDonald, A. Chew, D. Gehre, H Hasegawa, C. Hitzman, J. Ko, C W. Magee, N. Montgomery, P. Peres, P. Ronsheim, S. Yoshikawa, M. Schuhmacher, W. Stockwell, D. Sykes, M. Tomita, F. Toujou, J. Won
Citation
Applied Surface Science
Volume
252
Issue
19

Citation

Lindstrom, R. , Simons, D. , Bennett, R. , Benbalagh, R. , MacDonald, B. , Chew, A. , Gehre, D. , Hasegawa, H. , Hitzman, C. , Ko, J. , Magee, C. , Montgomery, N. , Peres, P. , Ronsheim, P. , Yoshikawa, S. , Schuhmacher, M. , Stockwell, W. , Sykes, D. , Tomita, M. , Toujou, F. and Won, J. (2006), Round-Robin Study of Arsenic Implant Dose Measurement in Silicon by SIMS, Applied Surface Science (Accessed May 3, 2024)
Created November 1, 2006, Updated February 17, 2017