This paper reports on the design and implementation of thin film multilayer dielectric reflectors on the sidewalls of micromachined reflector cells. Due to shadowing within the cavity, significant variations in the thicknesses of the thin films will be encountered when fabricated using PECVD. Such variations in deposition thickness cells may limit optical performance. An optimized design procedure is described to maximize the performance of the reflector under these variations. In addition, an optical design based on the superposition of multiple shifted quarter wave bragg reflectors is used to form a reflector with extended optical bandwidth. This extended reflectance range maintains high reflection at the D1 absorption wavelength of 87Rb over greater then 70% uniformity variation for use in miniature rubidium vapor cells for atomic MEMS applications.
Proceedings Title: Proceedings of the Hilton Head Workshop 2008: A Solid-State Sensors, Actuators, and Microsystems Workshop
Conference Dates: June 1-5, 2008
Conference Location: Hilton Head, SC
Conference Title: Proc. 2008 Hilton Head Sensors and Actuators Conference
Pub Type: Conferences
micromachining, alkali vapor cell, atomic clock, magnetometer, gyroscope