Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Quasi-TEM Characteristic Impedance of Micromachined CMOS Coplanar Waveguides

Published

Author(s)

Mehmet Ozgur, V. Milanovic, C. A. Zincke, Michael Gaitan, Mona E. Zaghloul

Abstract

Micromachined coplanar waveguides fabricated in CMOS technology consist of glass-encapsulated finite-thickness metal conductor strips, fully suspended by selective etching of the silicon substrate. Determination of the quasi-TEM mode characteristic impedance requires knowledge of the quasi-static capcitance of the complete structure, and the quasi-static capacitance of the equivalent air-line structure. In this paper, analytical results are derived for such structures based on conformal mapping transformations and partial capacitance approach. The analytical results and proposed approximations are verified by a finite-difference computational approach and by measurement results on various sample structures. The results are useful for solving general capacitance problems for finite-thickness planar transmission lines with multi-layer dielectric.
Citation
IEEE Transactions on Microwave Theory and Techniques

Keywords

Silicon micromachining, coplanar waveguide, quasi-static, quasi-TEM mode, characteristic impedance, effective permittivity

Citation

Ozgur, M. , Milanovic, V. , Zincke, C. , Gaitan, M. and Zaghloul, M. (2000), Quasi-TEM Characteristic Impedance of Micromachined CMOS Coplanar Waveguides, IEEE Transactions on Microwave Theory and Techniques (Accessed July 17, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created May 4, 2000, Updated October 12, 2021