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Quantitative Depth Profiling of an Alternating Pt/Co Multilayer and a Pt Co Alloy multilayer by SIMS using a Buckminsterfullerene (C60) Source

Published

Author(s)

K.J. Kim, David S. Simons, J Greg Gillen

Abstract

Buckmins erfullerene ion beam has been applied o he dep h profiling of an al erna ing pure P and pure Co mul ilayer. Quan i a ive dep h profiling was performed by secondary ion mass spec rome ry (SIMS) wi h C60 ions using P Co alloy films wi h differen composi ions. Rela ive sensi ivi y fac ors (RSFs) derived from a P 39Co61 alloy film were used o conver an original dep h profile o a composi ion dep h profile. A severe in erface ar ifac observed in he dep h profile of a P /Co mul ilayer was quan i a ively correla ed wi h a gradual varia ion of ma rix composi ion hrough he P /Co and Co/P in erfaces by comparison wi h he dep h profiling of an alloy mul ilayer film. Moreover, he in erface ar ifac could be compensa ed by conversion of he profile o a composi ion profile using he same RSFs. The dep h resolu ions of a P /Co mul ilayer derived from he composi ion dep h profile were much larger han he apparen in erface wid hs measured from he original dep h profile due o he nonlinear rela ionship be ween he Co and P ion in ensi ies and heir composi ions.
Citation
Applied Surface Science
Volume
253
Issue
14

Keywords

Buckminsterfullerene ion, SIMS quantification, Depth profiling, Interface artifact

Citation

Kim, K. , Simons, D. and Gillen, J. (2007), Quantitative Depth Profiling of an Alternating Pt/Co Multilayer and a Pt Co Alloy multilayer by SIMS using a Buckminsterfullerene (C60) Source, Applied Surface Science (Accessed February 26, 2024)
Created May 14, 2007, Updated October 12, 2021