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preface to Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics, edited by H. R. Huff, C. A. Richter, M. L. Green, G. Lucovsky, and T. Hattori

Published

Author(s)

H. R. Huff, Curt A. Richter, M. L. Green, G. Lucovsky, T. Hattori
Proceedings Title
Proc., Mater. Res. Soc. Symp.
Conference Location
Pittsburgh, PA, USA

Citation

Huff, H. , Richter, C. , Green, M. , Lucovsky, G. and Hattori, T. (1999), preface to Ultrathin SiO<sub>2</sub> and High-K Materials for ULSI Gate Dielectrics, edited by H. R. Huff, C. A. Richter, M. L. Green, G. Lucovsky, and T. Hattori, Proc., Mater. Res. Soc. Symp. , Pittsburgh, PA, USA (Accessed February 29, 2024)
Created August 31, 1999, Updated October 12, 2021