Huff, H.
, Richter, C.
, Green, M.
, Lucovsky, G.
and Hattori, T.
(1999),
preface to Ultrathin SiO<sub>2</sub> and High-K Materials for ULSI Gate Dielectrics, edited by H. R. Huff, C. A. Richter, M. L. Green, G. Lucovsky, and T. Hattori, Proc., Mater. Res. Soc. Symp. , Pittsburgh, PA, USA
(Accessed April 26, 2024)
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preface to Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics, edited by H. R. Huff, C. A. Richter, M. L. Green, G. Lucovsky, and T. Hattori
Published
Author(s)
H. R. Huff, , M. L. Green, G. Lucovsky, T. Hattori
Proceedings Title
Proc., Mater. Res. Soc. Symp.
Conference Location
Pittsburgh, PA, USA
Pub Type
Conferences
Citation
Created August 31, 1999, Updated October 12, 2021