Verma, V.
, Stevens, M.
, Silverman, K.
, Dias, N.
, Garg, A.
, Coleman, J.
and Mirin, R.
(2011),
Polarization dependent photoluminescence of elliptical quantum dots defined by lithographic patterning, Applied Physics Letters, [online], https://doi.org/10.1063/1.3599889
(Accessed October 27, 2025)
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Polarization dependent photoluminescence of elliptical quantum dots defined by lithographic patterning
Published
Author(s)
, , , Neville Dias, Akash Garg, James J. Coleman,
Abstract
We measure the polarization state of the photoluminescence of elliptically shaped lithographically patterned quantum dots fabricated using a wet etching and regrowth technique. We show that the dipole moment of the ground state of elliptical quantum dots is predominantly aligned with the major axis of the ellipse. The lithographic patterning technique allows for the arbitrary orientation of the ellipse, allowing control over the polarization state of emission. This technique may prove useful for polarization control of single photon sources as well as spatial and spectral mode control in vertical cavity lasers.Citation
Applied Physics Letters
Volume
109
Issue
12
Pub Type
Journals
Download Paper
Keywords
quantum dot, polarization, single photon
Citation
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Created June 15, 2011, Updated November 10, 2018