NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Polarization dependent photoluminescence of elliptical quantum dots defined by lithographic patterning
Published
Author(s)
Varun B. Verma, Martin J. Stevens, Kevin L. Silverman, Neville Dias, Akash Garg, James J. Coleman, Richard P. Mirin
Abstract
We measure the polarization state of the photoluminescence of elliptically shaped lithographically patterned quantum dots fabricated using a wet etching and regrowth technique. We show that the dipole moment of the ground state of elliptical quantum dots is predominantly aligned with the major axis of the ellipse. The lithographic patterning technique allows for the arbitrary orientation of the ellipse, allowing control over the polarization state of emission. This technique may prove useful for polarization control of single photon sources as well as spatial and spectral mode control in vertical cavity lasers.
Verma, V.
, Stevens, M.
, Silverman, K.
, Dias, N.
, Garg, A.
, Coleman, J.
and Mirin, R.
(2011),
Polarization dependent photoluminescence of elliptical quantum dots defined by lithographic patterning, Applied Physics Letters, [online], https://doi.org/10.1063/1.3599889
(Accessed October 10, 2025)