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Pb electrodeposition on (111)-textured Cu in the Presence and Absence of C1superscript -}: a Combined Oblique Incidence Reflectivity Difference and In-situ AFM Study

Published

Author(s)

G Y. Wu, S E. Bae, A A. Gewirth, J Gray, X D. Zhu, Thomas P. Moffat, W Schwarzacher

Abstract

Oblique incidence reflectivity difference measurements reveal differences in the earliest stages of growth between Pb electrodeposition on (111)-textured Cu in the presence and absence of C1superscript -}. At moderate over potentials, when only 100 mM C1Osubscript 4, superscript -} is present, the real part of the OI-RD signal increases immediately after completion the first underpotential-deposited (UPD) Pb monolayer, but when 20 mM KC1 is added the signal instead decreases. In-situ atomic force microscopy (AFM) shows that in the former case the island density is much greater than in the latter. Using OI-RD as a probe, we show additionally that when the substrate potential is returned to a more positive potential in the presence of C1subscript -}, the UPD Pb monolayer dissolves only after the Pb islands disappear.
Citation
Surface Science

Citation

Wu, G. , Bae, S. , Gewirth, A. , Gray, J. , Zhu, X. , Moffat, T. and Schwarzacher, W. (2021), Pb electrodeposition on (111)-textured Cu in the Presence and Absence of C1{superscript -}: a Combined Oblique Incidence Reflectivity Difference and In-situ AFM Study, Surface Science (Accessed August 7, 2022)
Created October 12, 2021