Litorja, M.
(2001),
Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen, Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen
(Accessed September 16, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen
Published
Author(s)
Abstract
The oxidation of Si(100) covered with deuterium, ethylene and acetylene by oxygen atoms was studied using Auger electron spectroscopy. Oxygen atoms were generated by vacuum ultraviolet (157 nm) laser photolysis of molecular oxygen. The oxygen uptake is linear for oxide coverages in the 1-3 monolayer range, and a difference in the facility of oxidation is observed for the three systems. These reactivity differences are discussed in terms of mechanistic, geometrical and electronic structural differences for these adsorbate-surface systems.Citation
Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen
Pub Type
Others
Keywords
adsorbate-surface systems, atomic oxygen, Auger electron spectroscopy, Si(100), Si(100) oxidation
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 2001, Updated February 17, 2017