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Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen

Published

Author(s)

Maritoni A. Litorja

Abstract

The oxidation of Si(100) covered with deuterium, ethylene and acetylene by oxygen atoms was studied using Auger electron spectroscopy. Oxygen atoms were generated by vacuum ultraviolet (157 nm) laser photolysis of molecular oxygen. The oxygen uptake is linear for oxide coverages in the 1-3 monolayer range, and a difference in the facility of oxidation is observed for the three systems. These reactivity differences are discussed in terms of mechanistic, geometrical and electronic structural differences for these adsorbate-surface systems.
Citation
Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen

Keywords

adsorbate-surface systems, atomic oxygen, Auger electron spectroscopy, Si(100), Si(100) oxidation

Citation

Litorja, M. (2001), Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen, Oxidation of Ethylene and Acetylene Adsorbed on Si(100) by Atomic Oxygen (Accessed May 26, 2024)

Issues

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Created January 1, 2001, Updated February 17, 2017