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Doo-In Kim, Jaroslaw Grobelny, Pradeep N. Namboodiri, Robert F. Cook
Abstract
The origin of adhesion at nanoscale contacts in humid air is investigated by pull-off force measurements using atomic force microscopes in controlled environments from ultra-high vacuum through various humidity conditions to water. An equivalent work of adhesion (WOA) model with a simplified interface stress distribution is developed, combining the effects of screened van der Waals and meniscus forces, that describes adhesion in humid air and which self-consistently treats the contact stress and deformation. Although the pull-off force is found to vary significantly with humidity, the equivalent WOA is found to be invariant. Increasing humidity alters the nature of the surface adhesion from a compliant contact with a localized, intense meniscus force to a stiff contact with an extended, weak meniscus force.
Kim, D.
, Grobelny, J.
, Namboodiri, P.
and Cook, R.
(2008),
Origin of Adhesion in Humid Air, Langmuir, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851021
(Accessed June 8, 2023)