Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Nondestructive and Economical Dimensional Metrology of Deep Structures

Published

Author(s)

Ravikiran Attota, Hyeonggon Kang, Benjamin Bunday
Conference Dates
April 2-4, 2019
Conference Location
Monterey, CA
Conference Title
Frontiers of Characterization and Metrology for Nanoelectronics (FCMN)

Keywords

TSOM, nondestructive process control, three-dimensional metrology, through-focus scanning optical microscopy, nanometrology, packaging metrology, high-throughput semiconductor metrology

Citation

Attota, R. , Kang, H. and Bunday, B. (2019), Nondestructive and Economical Dimensional Metrology of Deep Structures, Frontiers of Characterization and Metrology for Nanoelectronics (FCMN), Monterey, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=927455 (Accessed June 19, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 1, 2019, Updated January 27, 2020