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Nondestructive and Economical Dimensional Metrology of Deep Structures

Published

Author(s)

Ravikiran Attota, Hyeonggon Kang, Benjamin Bunday
Conference Dates
April 2-4, 2019
Conference Location
Monterey, CA
Conference Title
Frontiers of Characterization and Metrology for Nanoelectronics (FCMN)

Keywords

TSOM, nondestructive process control, three-dimensional metrology, through-focus scanning optical microscopy, nanometrology, packaging metrology, high-throughput semiconductor metrology

Citation

Attota, R. , Kang, H. and Bunday, B. (2019), Nondestructive and Economical Dimensional Metrology of Deep Structures, Frontiers of Characterization and Metrology for Nanoelectronics (FCMN), Monterey, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=927455 (Accessed April 27, 2024)
Created April 1, 2019, Updated January 27, 2020