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NEW DESIGNS FOR HIGH-RESISTANCE STANDARD RESISTORS
Published
Author(s)
Andrew J. Dupree, Dean G. Jarrett
Abstract
Discussed are the efforts undertaken at the National Institute of Standards and Technology to create a new set of high-resistance standards (specifically the 10 MΩ to 100 MΩ range) using newer more stable film-type resistors. The history of film-type resistors in high-resistance standards is briefly reviewed. Also examined are the improvements made upon similar resistance standard implementations done by the Instituto Nacional de Tecnología Industrial (INTI) in Argentina, primarily the use of a guarded, highly resistive backbone to reduce leakage currents. Promising results, including reduced settling time and improved stability, are presented.
Proceedings Title
2010 Conference on Precision Electromagnetic Measurements Conference Digest
Volume
978-1-4244-6794-5/10
Conference Dates
June 13-18, 2010
Conference Location
Daejeon, KR
Conference Title
2010 Conference on Precision Electromagnetic Measurements
Dupree, A.
and Jarrett, D.
(2010),
NEW DESIGNS FOR HIGH-RESISTANCE STANDARD RESISTORS, 2010 Conference on Precision Electromagnetic Measurements Conference Digest, Daejeon, KR, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=904825
(Accessed October 13, 2025)