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Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition

Published

Author(s)

D M. Tanenbaum, A L. Laracuente, A Gallagher
Citation
Applied Physics Letters
Volume
68

Citation

Tanenbaum, D. , Laracuente, A. and Gallagher, A. (1996), Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition, Applied Physics Letters (Accessed June 13, 2024)

Issues

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Created January 1, 1996, Updated February 17, 2017