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Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM

Published

Author(s)

Michael T. Postek, Andras Vladar, John S. Villarrubia

Abstract

The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is the detrimental effects induced by the electron beam interactions of these small particles in secondary electron detection mode which dominate in the imaging. Such effects are minimized in the transmission electron detection mode of the SEM and can lead to accurate metrology of nanoparticles. Work is being done in the Precision Engineering Division of the National Institute of Standards and Technology (NIST) to develop infrastructural metrology and ultra high resolution imaging for measurements of nanoparticles using the Hitachi S-5500 STEM. Such metrology development is critical to the characterization of nanoparticles for many industrial applications and the emerging research for environmental, health and safety.
Citation
Hitachi News

Citation

Postek, M. , Vladar, A. and Villarrubia, J. (2009), Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM, Hitachi News, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=902308 (Accessed June 22, 2024)

Issues

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Created September 1, 2009, Updated February 19, 2017