Bajt, S.
, Chapman, H.
, Spiller, E.
, Hau-Riege, S.
, Alameda, J.
, Nelson, A.
, Walton, C.
, Kjornrattanawanich, B.
, Aquila, A.
, Tarrio, C.
and Grantham, S.
(2007),
Multilayers for Next Generation X-Ray Sources, SPIE
(Accessed September 13, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Multilayers for Next Generation X-Ray Sources
Published
Author(s)
Sasa Bajt, H N. Chapman, E Spiller, S Hau-Riege, J Alameda, A J. Nelson, C C. Walton, B Kjornrattanawanich, Andrew Aquila, ,
Abstract
Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons and x-ray free electron lasers) requires advances in x-ray optics. Newly developed multilayer-based mirrors and optical elements enabled efficient band-pass filtering, focusing and time resolved measurements in recent FLASH (Free Electron LASer in Hamburg) experiments. These experiments are providing invaluable feedback on the response of the multilayer structures to high intensity, short pulsed x-ray sources. This information is crucial to design optics for future x-ray free electron lasers and to benchmark computer codes that simulate damage processes.Citation
SPIE
Volume
6586
Pub Type
Journals
Keywords
free electron laser, multilayer, optics damage
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created November 30, 2007, Updated October 12, 2021