MoS2 cleaning by acetone and UV-Ozone: Geological vs. synthetic material (Letter)

Published

January 25, 2019

Author(s)

Keren M. Freedy, Sales G. Maria, Sergiy Krylyuk, Albert Davydov, Stephen J. McDonnell

Abstract

The effects of poly(methyl methacrylate) PMMA removal procedures on the surface chemistry of both geological and chemical vapor deposited (CVD) MoS2 are investigated. X-ray photoelectron spectroscopy is employed following acetone dissolution, thermal annealing, and ultraviolet- ozone (UV-O3) treatment of PMMA-coated MoS2 samples. We find that acetone dissolution followed by thermal annealing results in partial removal of polymer residues from CVD MoS2 and nearly complete removal from geological MoS2. Exposure to UV-O3 for a total of 5 min was found to remove all residues from the geological sample but not from the CVD material. UV-O3 treatment of the CVD sample results in Mo-S bond scission and the formation of Mo-O and S-O chemical states, whereas the geological sample exhibits S-O bonding only on its surface with no disruption of Mo-S bonds. This work demonstrates that geological and synthetic films exhibit different surface reactivity resulting from polymer removal methods, likely due to differences in surface morphology and material quality.

Citation

Applied Surface Science

Volume

478

Pub Type

Journals

Keywords

Surface treatments, Ozone, X-ray photoelectron spectroscopy, Photoresist residues

Citation

Freedy, K. , Maria, S. , Krylyuk, S. , Davydov, A. and McDonnell, S. (2019), MoS2 cleaning by acetone and UV-Ozone: Geological vs. synthetic material (Letter), Applied Surface Science (Accessed April 20, 2024)