Monte Carlo Simulation for Radiometric Temperature Measurement in Rapid Thermal Processing

Published

November 1, 2000

Author(s)

Yong Zhou, Y J. Shen, Z M. Zhang, Benjamin K. Tsai, D P. DeWitt

Abstract

This work employs a Monte Carlo method to study the radiative process in a rapid thermal processing (RTP) furnace. A true effective emissivity, accounting for the directional optical properties, is defined and predicted in order to determine the wafer temperature from the measured spectral radiance temperature using light-pipe radiation thermometry (LPRT). The true effective emissivity is the same as the hemispherical effective emissivity for diffuse wafers, in which case the Monte Carlo model gives the same results as the net-radiation method. Deviations exist between the hemispherical effective emissivity and the true effective emissivity for specular wafers because the effective emissivity is directional dependent. This research will help reduce the uncertainty in the temperature measurement for RTP furnaces to meet the future requirement for integrated circuit manufacturing.

Proceedings Title

Vol. 5 Industrial Applications of Computational Heat Transfer, Session | | | ASME

Volume

366

Issue

No. 5

Conference Dates

November 1, 2000

Conference Location

Undefined

Conference Title

ASME -Publications- HTD

Pub Type

Conferences

Keywords

effective emissivity, light pipe radiation thermometry (LPRT), Monte Carlo method, net radiation method, optical properties, radiometric temperature measurement, rapid thermal processing (RTP), temperature, uncertainty

Citation

Zhou, Y. , Shen, Y. , Zhang, Z. , Tsai, B. and DeWitt, D. (2000), Monte Carlo Simulation for Radiometric Temperature Measurement in Rapid Thermal Processing, Vol. 5 Industrial Applications of Computational Heat Transfer, Session | | | ASME, Undefined (Accessed May 7, 2024)