Hastie, J.
, Bonnell, D.
and Schenck, P.
(1984),
Molecular basis for laser-induced vaporization of refractory materials:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.IR.84-2983
(Accessed March 20, 2025)
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Molecular basis for laser-induced vaporization of refractory materials:
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- NBS IR 84-2983
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NBS IR 84-2983
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NIST Pubs
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Created January 1, 1984, Updated May 19, 2023