Germer, T.
(2002),
Measurement of Lithographic Overlay by Light Scattering Ellipsometry, ed. by Z.H. Gu and A.A. Maradudin, Surface Scattering and Diffraction for Advanced Metrology II , Seattle, WA
(Accessed September 16, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Measurement of Lithographic Overlay by Light Scattering Ellipsometry, ed. by Z.H. Gu and A.A. Maradudin
Published
Author(s)
Proceedings Title
Surface Scattering and Diffraction for Advanced Metrology II
Conference Dates
July 9-11, 2002
Conference Location
Seattle, WA
Conference Title
Proc. SPIE 4780
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 2002, Updated February 17, 2017