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MAUD Rietveld Refinement Software for Neutron Diffraction Texture Studies of Single and Dual-Phase Materials
Published
Author(s)
Alec Saville, Emily Mitchell, Sven Vogel, Adam Abel Creuziger, Jake Benzing, Kester Clarke, Jonah Klemm-Toole, Amy Clarke
Abstract
This work presents a detailed instructional demonstration using the Rietveld refinement software MAUD for evaluating the crystallographic texture of single- and dual-phase materials, as applied to High-Pressure-Preferred-Orientation (HIPPO) neutron diffraction data obtained at Los Alamos National Laboratory (LANL) and electron backscatter diffraction (EBSD) pole figures on Ti–6Al–4V produced by additive manufacturing. This work addresses a number of hidden challenges intrinsic to Rietveld refinement and operation of the software to improve users' experiences when using MAUD. A systematic evaluation of each step in the MAUD refinement process is described, focusing on devising a consistent refinement process for any version of MAUD and any material system, while also calling out required updates to previously developed processes. A number of possible issues users may encounter are documented and explained, along with a multilayered assessment for validating when a MAUD refinement procedure is finished for any dataset. A brief discussion on appropriate sample symmetries is also included to highlight possible oversimplifications of the texture data extracted from MAUD. Included in the appendix of this work are two systematic walkthroughs applying the process described. Files for these walkthroughs can be found at the data repository located at: https://doi.org/10.18434/mds2-2400.
Citation
Integrating Materials and Manufacturing Innovation
Saville, A.
, Mitchell, E.
, Vogel, S.
, Creuziger, A.
, Benzing, J.
, Clarke, K.
, Klemm-Toole, J.
and Clarke, A.
(2021),
MAUD Rietveld Refinement Software for Neutron Diffraction Texture Studies of Single and Dual-Phase Materials, Integrating Materials and Manufacturing Innovation, [online], https://doi.org/10.1007/s40192-021-00224-5, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=932239
(Accessed October 22, 2025)