NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance
Published
Author(s)
John Unguris, D. Tulchinsky, Michael H. Kelley, Julie Borchers, Joseph Dura, Charles Majkrzak, S. Y. Hsu, R. Loloee, W. P. Pratt, J. Bass
Abstract
The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6nm)/Cu(6nm)]20 multilayers was analyzed using polarized neutron reflectivity and scanning electron microscopy with polarization analysis (SEMPA). This article focuses and expands on the SEMPA measurements. In multilayer structures such as these, SEMPA can be combined with ion milling to directly image the layer-by-layer magnetization and quantitatively depth profile the interlayer magnetic domain correlations. We found that in the as-prepared Co/Cu multilayer, the domains are about 1 mum in size and the magnetizations in adjacent layers are almost completely oppositely aligned. The relative magnetoresistance derived from this measured degree of anticorrelation is in agreement with the measured magnetoresistance.
Citation
Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance
Pub Type
Journals
Citation
Unguris, J.
, Tulchinsky, D.
, Kelley, M.
, Borchers, J.
, Dura, J.
, Majkrzak, C.
, Hsu, S.
, Loloee, R.
, Pratt, W.
and Bass, J.
(2021),
Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance, Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance
(Accessed October 9, 2025)