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Lowering Band Gap of an Electroactive Metal–Organic Framework via Complementary Guest Intercalation

Published

Author(s)

Zhiyong Guo, Dillip K. Panda, Monica V. Gordillo, Amina Khatun, Hui Wu, Wei Zhou, Sourav Saha

Abstract

A new honeycomb-shaped electroactive metal-organic framework (MOF) has been constructed from an electron deficient naphthalenediimide (NDI) ligand equipped with two terminal salicylic acid groups. π-Intercalation of electron rich planar tetrathiafulvalene (TTF) guests between the NDI ligands stacked along the walls lowers the electronic band gap of the material by ca. 1 eV. An improved electron delocalization through the guest-mediated π-donor/acceptor stacks is attributed to band-gap suppression, which portends enhanced electric conductivity.
Citation
ACS Applied Materials and Interfaces
Volume
9

Keywords

Band Gap Engineering, Porous Materials

Citation

Guo, Z. , Panda, D. , Gordillo, M. , Khatun, A. , Wu, H. , Zhou, W. and Saha, S. (2017), Lowering Band Gap of an Electroactive Metal–Organic Framework via Complementary Guest Intercalation, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=923582 (Accessed April 24, 2024)
Created September 26, 2017, Updated October 12, 2021