Guo, Z.
, Panda, D.
, Gordillo, M.
, Khatun, A.
, Wu, H.
, Zhou, W.
and Saha, S.
(2017),
Lowering Band Gap of an Electroactive Metal–Organic Framework via Complementary Guest Intercalation, ACS Applied Materials and Interfaces, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=923582
(Accessed November 4, 2025)
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Lowering Band Gap of an Electroactive Metal–Organic Framework via Complementary Guest Intercalation
Published
Author(s)
Zhiyong Guo, Dillip K. Panda, Monica V. Gordillo, Amina Khatun, , , Sourav Saha
Abstract
A new honeycomb-shaped electroactive metal-organic framework (MOF) has been constructed from an electron deficient naphthalenediimide (NDI) ligand equipped with two terminal salicylic acid groups. π-Intercalation of electron rich planar tetrathiafulvalene (TTF) guests between the NDI ligands stacked along the walls lowers the electronic band gap of the material by ca. 1 eV. An improved electron delocalization through the guest-mediated π-donor/acceptor stacks is attributed to band-gap suppression, which portends enhanced electric conductivity.Citation
ACS Applied Materials and Interfaces
Volume
9
Pub Type
Journals
Download Paper
Keywords
Band Gap Engineering, Porous Materials
Citation
Issues
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Created September 26, 2017, Updated October 12, 2021