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Low-keV Transmission Electron Imaging and Diffraction of Ultrathin Highly Beam-Sensitive MFI Zeolites in a Scanning Electron Microscope

Published

Author(s)

Jason Holm

Abstract

This manuscript demonstrates the susceptibility of ultrathin Mobil Five (MFI) zeolite nanosheets to low-keV electron beam damage in a scanning electron microscope (SEM). Beam dose rates and characteristic beam doses are quantified at beam energies from 15 keV to 30 keV using an on-axis transmission electron detector to measure signal decay times in diffraction patterns and by underfocusing to enable spot size measurement. Characteristic beam doses ranged from approximately 1.9 C/cm2 at 15 keV to 14 C/cm2 at 30 keV, and the damage mechanism was attributable to radiolysis but other processes including electrostatic charging and sputtering could not be ruled out.
Citation
Microscopy and Microanalysis

Keywords

beam damage, dose, SEM, 4D STEM, STEM-in-SEM, zeolite, 2D materials

Citation

Holm, J. (2022), Low-keV Transmission Electron Imaging and Diffraction of Ultrathin Highly Beam-Sensitive MFI Zeolites in a Scanning Electron Microscope, Microscopy and Microanalysis, [online], https://doi.org/10.1093/micmic/ozac010, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=934693 (Accessed May 28, 2024)

Issues

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Created December 20, 2022, Updated January 24, 2023