Laser Sample Stage-Based Image Resolution Enhancement Method for SEMs

Published

May 24, 2004

Author(s)

Andras Vladar, Crossley E. Jayewardene, Bradley N. Damazo, William J. Keery, Michael T. Postek

Abstract

The development of a very fast, very accurate laser stage measurement system facilitates a new method to enhance the image and line scan resolution of scanning electron microscopes (SEMs). This method, allows for fast signal intensity and displacement measurements, and can report hundreds of thousands of measurement points in just a few seconds. It is possible then, to account for the stage position in almost real time with a resolution of 0.2 nm. The extent and direction of the stage motion reveal important characteristics of the stage vibration and drift, and helps to minimize them. The high accuracy and speed also allows for a convenient and effective technique for diminishing these problems by correlating instantaneous position and imaging intensity. The new measurement technique gives a possibility for significantly improving SEM-based dimensional measurement quality.

Proceedings Title

Proceedings of SPIE

Volume

5375

Issue

Part 2

Conference Dates

February 23, 2004

Conference Location

Santa Clara, CA

Conference Title

Metrology, Inspection, and Process Control for Microlithography XVIII, Richard M. Silver, Editor May 2004, Poster Session

Pub Type

Conferences

Keywords

CD-SEM, enhancement, image, interferometer, laser, resolution, scanning electron microscope, SEM, stage

Citation

Vladar, A. , Jayewardene, C. , Damazo, B. , Keery, W. and Postek, M. (2004), Laser Sample Stage-Based Image Resolution Enhancement Method for SEMs, Proceedings of SPIE, Santa Clara, CA (Accessed July 2, 2025)