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A Kurtosis-Based Statistical Measure for Two-Dimensional Processes and Its Applications to Image Sharpness
Published
Author(s)
Nien F. Zhang, Andras Vladar, Michael T. Postek, Robert D. Larrabee
Abstract
Fully automated or semiautomatic scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. It is required that these automated instruments be routinely capable of 3 nanometer (nm) or better resolution below 1kV accelerating voltage for the measurement of a nominal 70-150 nm size parts of the integrated circuits. The testing and proving that the instrument is performing at this level for production on a day-by-day basis, however, has not been routinely employed. Once a human operator is no longer monitoring the instrument s performance and multiple instruments are concerned, an objective diagnostic procedure must be implemented to ensure data and measurement fidelity.
Citation
Proceedings of the 2003 Section on Physical and Engineering Sciences
Pub Type
Journals
Keywords
autocorrelation, discrete Fourier transform, periodograms, scanning electron microscope, stationary process
Citation
Zhang, N.
, Vladar, A.
, Postek, M.
and Larrabee, R.
(2003),
A Kurtosis-Based Statistical Measure for Two-Dimensional Processes and Its Applications to Image Sharpness, Proceedings of the 2003 Section on Physical and Engineering Sciences
(Accessed October 11, 2025)