Hyett, G.
, Green, M.
and Parkin, I.
(2008),
An Investigation of Titanium-Vanadium Nitride Phase Space, Conducted Using Combinatorial Atmospheric Pressure CVD, Chemical Vapor Deposition, [online], https://doi.org/10.1002/cvde.200806705, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=610057
(Accessed October 12, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
An Investigation of Titanium-Vanadium Nitride Phase Space, Conducted Using Combinatorial Atmospheric Pressure CVD
Published
Author(s)
Geoffrey Hyett, , Ivan P. Parkin
Abstract
The technique of combinatorial atmospheric pressure chemical vapour deposition, a recent addition to growing number of combinatorial synthesis methods, has been used to form 12 members of the TixV1-xN alloy series with 0.38 < x < 094. This series of compounds has the rock- salt structure with TiN and VN as the end members. The 12 phases, which are potentially useful as heat mirror coatings, were all synthesized in a single experiment. The structure and properties of the materials were investigated using powder X-ray diffraction and WDX. The optical properties were measured by visible-IR spectroscopy, which allows the investigation of the films suitability as solar control coatings, and optimisation as a function of composition.Citation
Chemical Vapor Deposition
Volume
14
Issue
9-10
Pub Type
Journals
Download Paper
Keywords
Chemical vapour deposition
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created September 30, 2008, Updated March 18, 2024