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An Investigation of Titanium-Vanadium Nitride Phase Space, Conducted Using Combinatorial Atmospheric Pressure CVD

Published

Author(s)

Geoffrey Hyett, Mark Green, Ivan P. Parkin

Abstract

The technique of combinatorial atmospheric pressure chemical vapour deposition, a recent addition to growing number of combinatorial synthesis methods, has been used to form 12 members of the TixV1-xN alloy series with 0.38 < x < 094. This series of compounds has the rock- salt structure with TiN and VN as the end members. The 12 phases, which are potentially useful as heat mirror coatings, were all synthesized in a single experiment. The structure and properties of the materials were investigated using powder X-ray diffraction and WDX. The optical properties were measured by visible-IR spectroscopy, which allows the investigation of the films suitability as solar control coatings, and optimisation as a function of composition.
Citation
Chemical Vapor Deposition
Volume
14
Issue
9-10

Keywords

Chemical vapour deposition

Citation

Hyett, G. , Green, M. and Parkin, I. (2008), An Investigation of Titanium-Vanadium Nitride Phase Space, Conducted Using Combinatorial Atmospheric Pressure CVD, Chemical Vapor Deposition, [online], https://doi.org/10.1002/cvde.200806705, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=610057 (Accessed April 19, 2024)
Created September 30, 2008, Updated March 18, 2024