Investigation and Control of Spatial Characteristics of Chamber-Cleaning Plasmas

Published

February 1, 2001

Author(s)

Kristen L. Steffens, Mark A. Sobolewski

Abstract

Planar laser-induced fluorescence (PLIF) measurements were made to determine 2-D spatial maps of CF2 density as a chemical marker of plasma uniformity in 9%O2/91%CF4 chamber-cleaning plasmas. Measurements were made in the capacitively-coupled Gaseous Electronics Conference (GEC) RF Reference Cell as pressure was varied from 13.3Pa (100mTorr) to 133.3Pa (1000mTorr) and electrode gap was varied from 2.25cm to 0.5cm. Discharge current and voltage measurements were also made and compared to the optical measurements. Smaller gaps resulted in increased radial uniformity and extended the pressure range over which CF2 density and electrical properties remain constant. These results provide insight into the optimization of chamber-cleaning processes and reactors as well as provide necessary data for validation of plasma simulations.

Proceedings Title

Characterization and Metrology for ULSI Technology | | AIP Conference Proceeding #550 Characterization and Metrology for ULSI Technology 2000: International Conference | AIP

Volume

550

Conference Dates

June 26-29, 2000

Conference Title

AIP Conference Proceedings

Pub Type

Conferences

Keywords

CF$, CF2, chamber-cleaning, optical and electrical diagnostics, planar laser-induced fluorescence, plasma, PLIF

Citation

, K. and Sobolewski, M. (2001), Investigation and Control of Spatial Characteristics of Chamber-Cleaning Plasmas, Characterization and Metrology for ULSI Technology | | AIP Conference Proceeding #550 Characterization and Metrology for ULSI Technology 2000: International Conference | AIP (Accessed May 10, 2024)