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Integrated photonic optomechanical atomic force microscopy probes batch fabricated using deep UV photolithography

Published

Author(s)

Diego Perez Morelo, Mingkang Wang, Venkatesh Madhaven, Mogana Sathisivan, Charlie Tay, Vladimir Aksyuk

Abstract

Chip-scale planar nanofabricated optomechanical devices that optically couple a mechanical moving nanostructure to an on-chip photonic cavity of high quality factor can be used for sensing motion with high precision and bandwidth. Motion in nanoscale mechanical structures can be measured optically on-chip with unprecedented precision and bandwidth. Wider scientific and commercial adoption of such sensors required the ability to mass fabricate, flexibility of design, and permanent fiber attachment for robustness and ease of use. In this paper, we demonstrated this by fabricating an atomic force microscopy probe using a commercial foundry process employing deep UV photolithography on 200 mm wafers. The batch fabricated devices with 150 nm minimum features perform similarly to the research prototypes previously fabricated using sequential electron beam lithography. This demonstration eliminates a key technical barrier to the wider adoption of high-performance integrated optomechanical sensing in nanomechanical transducers.
Citation
IEEE Journal of Microelectromechanical Systems
Volume
32
Issue
3

Keywords

integrated photonics, cavity optomechanical sensing

Citation

Perez Morelo, D. , Wang, M. , Madhaven, V. , Sathisivan, M. , Tay, C. and Aksyuk, V. (2023), Integrated photonic optomechanical atomic force microscopy probes batch fabricated using deep UV photolithography, IEEE Journal of Microelectromechanical Systems, [online], https://doi.org/10.1109/JMEMS.2023.3247300, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=935730 (Accessed May 30, 2024)

Issues

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Created June 3, 2023, Updated June 7, 2023