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Infrared hemispherical reflectance of carbon nanotube mats and arrays in the 5 um to 50 um wavelength region

Published

Author(s)

John H. Lehman, C J. Chunnilall, Evangelos Theocharous, Aric W. Sanders

Abstract

We present the absolute infrared (5 μm to 50 μm) reflectance of films produced from commercially available carbon nanotubes. Data were obtained using the upgraded NPL directional- hemispherical reflectance measurement facility. A brief description of this facility is presented, along with the results of the measurement of the test samples. One group of samples consisted of mats of carbon nanotubes with potassium silicate binder sprayed on copper and silicon substrates. Another group consisted of vertically aligned carbon nanotubes grown on silicon. Two of the materials studied exhibited the lowest hemispherical reflectance so far observed in the infrared wavelength region.
Proceedings Title
11th International Conference on New Developments and Applications in Optical Radiometry
Conference Dates
September 18-23, 2011
Conference Location
Maui, HI

Keywords

absolute reflectance, absorptance, carbon nanotube

Citation

Lehman, J. , Chunnilall, C. , Theocharous, E. and Sanders, A. (2012), Infrared hemispherical reflectance of carbon nanotube mats and arrays in the 5 um to 50 um wavelength region, 11th International Conference on New Developments and Applications in Optical Radiometry, Maui, HI, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908159 (Accessed May 18, 2022)
Created July 15, 2012, Updated December 12, 2017