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Improved Modeling of Residual Strain/Stress and Crystallite-Size Distribution in Rietveld Refinement*

Published

Author(s)

Davor Balzar, N Popa

Abstract

We propose two improvements to the microstructural modeling in Rietveld refinement. The first is the model that yields the complete texture-weighted strain and stress tensors for all Laue classes. Implementation in the Rietveld refinement program can be made through the set of refinable parameters that allow the calculation of strain and stress values. Another topic discussed is the problem of determination of coherently diffracting domain size and domain-size distributions. We present an approach where the exact size-broadened profile is obtained by averaging the interference function with a lognormal size distribution spherical crystallites. We show that obtained size-broadened profile can be successfully modeled by a combination of Gaussian and Lorentzianfunctions, which permits for an analytical convolution with strain and instrumental profiles in Rietveld programs. This model can successfully fit super-Lorentzian line profiles that originate from a large dispersion of crystallite sizes.
Citation
Advances In X-Ray Analysis

Keywords

crystallite size, lognormal distribution, Rietveld refinement, strain, stress, texture

Citation

Balzar, D. and Popa, N. (2008), Improved Modeling of Residual Strain/Stress and Crystallite-Size Distribution in Rietveld Refinement*, Advances In X-Ray Analysis (Accessed April 17, 2024)
Created October 16, 2008