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Impact of Directional Properties on the Radiometric Temperature Measurement in Rapid Thermal Processing
Published
Author(s)
Yong Zhou, Y J. Shen, Z M. Zhang, Benjamin K. Tsai, D P. DeWitt
Abstract
A quasi-Monte Carlo method has been developed to predict the effective emissivity for accurate radiometric temperature measurement in rapid thermal processing (RTP) furnaces. The hemispherical effective emissivities calculated from the Monte Carlo method agree with those calculated from the net-radiation method. The Monte Carlo method, however, can also be used to determine the directional effective emissivity and the true effective emissivity, which is needed to obtain the water temperature from the measured spectral radiance temperature by the light-pipe radiation thermometer (LPRT). If the water is not diffuse, the true effective emissivity may be quite different from the hemispherical emissivity, especially for specular wafers with emissivities less than 0.6. For the RTP system studied here, the numerical aperture of about 0.5 yields the largest effective emissivity.
Citation
International Conference on Advanced Thermal Processing of Semiconductors
Zhou, Y.
, Shen, Y.
, Zhang, Z.
, Tsai, B.
and DeWitt, D.
(2000),
Impact of Directional Properties on the Radiometric Temperature Measurement in Rapid Thermal Processing, International Conference on Advanced Thermal Processing of Semiconductors, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=850456
(Accessed October 8, 2025)