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PUBLICATIONS

Images of Strips On and Trenches In Substrates

Published

Author(s)

Egon Marx

Abstract

The computation of images of lines or strips on a substrate and trenches in a substrate or a layer above a substrate, all made of dielectric or absorbing materials, using integral equations equivalent to Maxwell's equations and using Fourier optics are explained in some detail.  Examples of computed images illustrating some of the features found in the images are provided.  Approximations involved in the model of the actual scatterer and microscope as well as the theoretical and numerical representations are discussed.
Citation
Applied Optics
Volume
46
Pub Type
Journals

Keywords

electromagnetic scattering, overlay, photomask, singular integral equations, two-dimensional Maxwell equations
Manufacturing and Metrology

Citation

Marx, E. (2007), Images of Strips On and Trenches In Substrates, Applied Optics (Accessed October 14, 2025)

Issues

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Created January 1, 2007, Updated June 2, 2021
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