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High-energy Ultra-Small Angle X-ray Scattering Instrument at the Advanced Photon Source



Andrew J. Allen, Lyle E. Levine, Fan Zhang, Gabrielle G. Long, Jan Ilavsky, Pete R. Jemian


This paper reports recent tests performed on the Bonse-Hart-type ultra-small angle X-ray scattering (USAXS) instrument at the Advanced Photon Source with higher-order reflection optics — Si (440) instead of Si (220) — and with X-ray energies greater than 21.0 keV. Our results demonstrate the feasibility of high-energy operation with narrower crystal reflectivity curves, which provides access to a scattering vector range from ≈ 2 × 10-5 to 1.8 Å-1 and up to 12 decades in the associated sample dependent scattering intensity range. The corresponding size range of the scattering features spans about 5 decades – from less than 1 Å to ≈ 30 μm. These tests have indicated that mechanical upgrades are required to ensure the alignment capability and operational stability of this instrument for general user operations due to the tighter angular-resolution constraints of the higher-order crystal optics. These upgrades are now underway.
Journal of Applied Crystallography


Bonse-Hart ultra-small-angle X-ray scattering instrument, USAXS, Ultra-high SAXS resolution


Allen, A. , Levine, L. , Zhang, F. , Long, G. , Ilavsky, J. and Jemian, P. (2012), High-energy Ultra-Small Angle X-ray Scattering Instrument at the Advanced Photon Source, Journal of Applied Crystallography, [online], (Accessed June 23, 2024)


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Created December 1, 2012, Updated February 19, 2017