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PUBLICATIONS

Harnessing Wrinkling Instabilities for Advanced Measurements of Polymeric Thin Films

Published

Author(s)

Jun Y. Chung, Rui Huang, Christopher Stafford

Abstract

Nanotechnology promises to revolutionize a growing set of materials applications ranging from electronics to drug delivery to ballistic protection. However, the quest to engineer materials on the nanoscale is met with the daunting task of measuring the physical and mechanical properties of these systems at these same length scales. For polymers, the challenge is even greater since conventional materials testing platforms lack the resolution for such soft systems. In this presentation, we will briefly review and discuss our current progress and advances in wrinkling metrology for characterizing physical, thermal, and mechanical properties of nanoscale polymeric materials.
Proceedings Title
American Chemical Society Division of Polymeric Materials: Science and Engineering| |Proceedings of the ACS Division of Polymeric Materials: Science & Engineering |ACS
Conference Dates
April 6-10, 2008
Conference Location
New Orleans, LA, US
Conference Title
American Chemical Society (Acs)
Pub Type
Conferences

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Local Download

Keywords

light scattering, mechanical properties, metrology, polymer, residual stress, thermal, thin film, wrinkling
Polymers and Materials characterization

Citation

Chung, J. , Huang, R. and Stafford, C. (2008), Harnessing Wrinkling Instabilities for Advanced Measurements of Polymeric Thin Films, American Chemical Society Division of Polymeric Materials: Science and Engineering| |Proceedings of the ACS Division of Polymeric Materials: Science & Engineering |ACS, New Orleans, LA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854497 (Accessed October 20, 2025)

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Created April 5, 2008, Updated October 12, 2021
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