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Growth-Induced In-Plane Uniaxial Anisotropy V2O3/Ni Films

Published

Author(s)

Dustin Allen Gilbert, Juan Gabriel Ramirez, T. Saerbeck, J. Trastoy, Ivan K. Schuller, Kai Liu, J. de la Venta

Abstract

We report a microstructure-induced uniaxial anisotropy in V2O3/Ni hybrid thin films obtained from temperature and angular dependence of the magnetization. X-ray diffraction and reciprocal space maps identify the in-plane crystalline axes of the V2O3; atomic force and scanning electron microscopy reveal oriented tears in the film microstructure. Magnetometry measurements identify a uniaxial magnetic easy axis along the tears. Magnetization reversal characteristics captured by angular-dependent first order reversal curve (FORC) measurements indicate a strong domain wall pinning along the direction orthogonal to the tears. Interestingly the magnetization reversal changes from localized domain reversal to domain growth as a function of orientation. The microstructure-induced shape anisotropy is most pronounced at room temperature, which is beneficial for potential device applications
Citation
Scientific Reports
Volume
7

Keywords

Magnetism, magnetic anisotropy, microstructure, FMR, Thin film, magnetic reversal, Vanadium

Citation

, D. , , J. , Saerbeck, T. , Trastoy, J. , , I. , Liu, K. and de, J. (2017), Growth-Induced In-Plane Uniaxial Anisotropy V<sub>2</sub>O<sub>3</sub>/Ni Films, Scientific Reports, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=922146 (Accessed May 26, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 18, 2017, Updated June 26, 2018