Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Ferroelectric thin films prepared by pulsed laser deposition processing and characterization:

Published

Author(s)

L P Cook, P K Schenck, C K Chiang, M D Vaudinl, W Wong-Ng
Citation
- NIST IR 4844
Report Number
NIST IR 4844

Citation

Cook, L. , Schenck, P. , Chiang, C. , Vaudinl, M. and Wong-ng, W. (1992), Ferroelectric thin films prepared by pulsed laser deposition processing and characterization:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.4844 (Accessed December 3, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1992, Updated May 19, 2023