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Ferroelectric thin films prepared by pulsed laser deposition processing and characterization:

Published

Author(s)

L P Cook, P K Schenck, C K Chiang, M D Vaudinl, W Wong-Ng
Citation
- NIST IR 4844
Report Number
NIST IR 4844

Citation

Cook, L. , Schenck, P. , Chiang, C. , Vaudinl, M. and Wong-ng, W. (1992), Ferroelectric thin films prepared by pulsed laser deposition processing and characterization:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.4844 (Accessed July 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1992, Updated May 19, 2023