The present investigation is the first comprehensive comparative study of x-ray diffraction (XRD) and transmission electron microscopy (TEM) results to address the important issue of fcc Ti formation in nanoscale multilayers Ti/Al multilayers with 7.2 and 5.2 nm composition modulation wavelengths were studied by reflection and transmission XRD as well as transmission electron diffraction (ED), high-resolution TEM, and energy-filtered TEM. Previous reports have claimed deposition of fcc Ti in multilayer systems. Our results demonstrate that the Ti in Ti/Al multilayers deposits in the hcp form and that fcc Ti is merely an artifact of producing specimens for cross-sectional TEM.
Citation: Journal of Materials Research
Issue: No. 5
Pub Type: Journals
aluminum, multilayer, thin film, titanium, transformation, transmission electron microscopy, x-ray diffraction